Hi,
I am studying VLSI basic( fabrication), i have few question about it.....
1.) The seed used for formation of ingot(cylindrical Si), is what???
2.) Why, FZ method is used for high voltage(power device) and low production, why not CZ..??
I am studying VLSI basic( fabrication), i have few question about it.....
1.) The seed used for formation of ingot(cylindrical Si), is what???
2.) Why, FZ method is used for high voltage(power device) and low production, why not CZ..??