1. Luiz Fernando Vieira

    Why is oxide not used in the CVD process in the manufacture of gate oxide in the NMOS device?

    I know that chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance solid materials. The process is often used in the manufacture of semiconductors to produce thin films, there are several CVD methods, such as LPCVD, PECVD etc. Depending on...