While good conceptually, physical diffusion of dopants into wafers to create source and drain regions of MOSFETs is obsolete. Ion implantation has been used for years, instead.
Is it worth mentioning that in the article, or does the simplicity of diffusion win the day?
Excellent chapter, by the way.
Is it worth mentioning that in the article, or does the simplicity of diffusion win the day?
Excellent chapter, by the way.